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학술지 Fine Neurite Patterns from Photocrosslinking of Cell-Repellent Benzophenone Copolymer
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저자
백남섭, 김용희, 한영환, Andreas Offenhausser, 정명애, 정상돈
발행일
201208
출처
Journal of Neuroscience Methods, v.210 no.2, pp.161-168
ISSN
0165-0270
출판사
Elsevier,
DOI
https://dx.doi.org/10.1016/j.jneumeth.2012.07.011
협약과제
11SF1700, 뉴런 및 수용체와 반도체 소자의 하이브리드 네트워크, 정명애
초록
We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ~77mW/cm2 at 280nm and ~60mW/cm2 at 365nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine. © 2012 Elsevier B.V.
키워드
Cell-repellent pattern, Patterned neuronal networks, Photocrosslinking, Primary neuronal culture
KSP 제안 키워드
L-lysine(Poly), Line width, Neuronal networks, Pattern fidelity, Poly-L-lysine, Poly-d-lysine, Primary neuronal culture, line pattern, oxidative damage