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학술지 Nonstick, Modulus-Tunable and Gas-Permeable Replicas for Mold-Based, High-Resolution Nanolithography
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저자
이봉국, 조현민, 정봉현
발행일
201110
출처
Advanced Functional Materials, v.21 no.19, pp.3681-3689
ISSN
1616-301X
출판사
John Wiley & Sons
DOI
https://dx.doi.org/10.1002/adfm.201101278
초록
A fundamental approach to fabricating a nonstick replica mold with high performance for the manufacturing of high-resolution nanostructures using mold-based lithography is presented. Low-viscosity liquid blends consisting of methacrylate multi-functionalized silsesquioxane (SSQMA), difunctional acrylics, and a small amount of silicone diacrylate (Si-DA) with low surface tension were used as nonstick replica-mold materials. The cured SSQMA/acrylic/Si-DA networks showed a high resistance to organic solvents (<1.2 wt.%), high UV transparency (>90% at 365 nm), hydrophobicity (water contact angle >90째), high modulus and wide-range modulus tunability (0.6-4.42 GPa) and small shrinkage (<3% in height). The mold materials with a nonstick property conferred by Si-DA possessed the ability to form sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1). In addition, a sufficiently cured replica mold with a low concentration of residual, uncross-linked (meth)acrylates was able to successfully replicate sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1), even if the release agent was not modified. Furthermore, replica molds can potentially be used to fabricate patterns free of bubble defects because of sufficient gas permeability. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
키워드
gas permeability, hybrid materials, mechanical properties, nanoimprinting, nonstick replica molds
KSP 제안 키워드
65 nm, Bubble defects, Co. KGaA, Contact angle(CA), Gas permeability, High aspect ratio, High modulus, High performance, High resistance, High-resolution, Low concentration