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Subjects : Quadrupole mass spectrometer

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Journal 2010 Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma   함용현  Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-5 5 원문
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