Subjects : FE-AES
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2011 | Dry Etching of TiN in N2/Cl2/Ar Adaptively Coupled Plasma Kim Dong -Pyo Vacuum, v.86, no.4, pp.380-385 | 5 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
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| Type | Year | Research Project | Primary Investigator | Download |
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