Subjects : Resistance optimization
| Type | Year | Title | Cited | Download |
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| Journal | 2024 | 112-Gbaud PAM4 Operation of Lumped-EML with 150-um EAM Length Using LC Resonance Based on Matching Resistance Optimization Yun Seok Jun Journal of Lightwave Technology, v.42, no.1, pp.229-235 | 2 | 원문 |
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