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Subjects : Reference surface

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Conference 2002 The Effects of Plasma Induced Damage on The Channel Layers of Ion Implanted GaAs MESFETs during Reactive Ion Etching(RIE) and Plasma Ashing Processes   Hokyun Ahn  Materials Research Society (MRS) Meeting 2002 (Spring), v.720, pp.67-72 1 원문
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