Subjects : Reference surface
Type | Year | Title | Cited | Download |
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Conference | 2002 | The Effects of Plasma Induced Damage on The Channel Layers of Ion Implanted GaAs MESFETs during Reactive Ion Etching(RIE) and Plasma Ashing Processes Hokyun Ahn Materials Research Society (MRS) Meeting 2002 (Spring), v.720, pp.67-72 | 1 | 원문 |
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