Subjects : Anisotropic etching
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Conference | 2002 | The Effects of Plasma Induced Damage on The Channel Layers of Ion Implanted GaAs MESFETs during Reactive Ion Etching(RIE) and Plasma Ashing Processes Hokyun Ahn Materials Research Society (MRS) Meeting 2002 (Spring), v.720, pp.67-72 | 1 | 원문 |
| Journal | 1998 | High-Quality Conformal Silicon Oxide Films Prepared by Multi-Step Sputtering PECVD and Chemical Mechanical Polishing Min Park Journal of Electronic Materials, v.27, no.11, pp.1262-1267 | 9 | 원문 |
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