Subjects : Cl atoms
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2010 | Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas 김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 | 5 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
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| Type | Year | Research Project | Primary Investigator | Download |
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