Subjects : Process development
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2009 | Process development of ITO source/drain electrode for the top-gate indium–gallium–zinc oxide transparent thin-film transistor Cheong Woo-Seok Thin Solid Films, v.517, no.14, pp.4094-4099 | 23 | 원문 |
| Journal | 2006 | Process Development of Small Form Factor Optical Recording Disk Cheong Woo-Seok Japanese Journal of Applied Physics, v.45, no.8A, pp.6275-6278 | 1 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
| No search results. | |||||
| Type | Year | Research Project | Primary Investigator | Download |
|---|---|---|---|---|
| Annual Report | 2024 | Standard Process Development and Service of compond semiconductor research foundry for communication | Kwon Yong-Hwan | |
| Annual Report | 2023 | Standard Process Development and Service of compond semiconductor research foundry for communication | Baek Yongsoon | |
| Annual Report | 2014 | Synthesis of Oxide Semiconductors and Insulator Ink Materials and Process Development for Printed Backplane of Flexible Displays Processed Below 150°C | Do Lee-Mi | |
| Annual Report | 2013 | Synthesis of Oxide Semiconductors and Insulator Ink Materials and Process Development for Printed Backplane of Flexible Displays Processed Below 150°C | Do Lee-Mi |