ETRI-Knowledge Sharing Plaform

ENGLISH

성과물

특허 검색
구분 출원국
출원년도 ~ 키워드

상세정보

등록 포토멀티플라이어 및 그의 제조방법

포토멀티플라이어 및 그의 제조방법
이미지 확대
발명자
이준성, 윤용선, 장원익, 김승환, 정은주
출원번호
13601948 (2012.08.31)
공개번호
20130056843 (2013.03.07)
등록번호
8871557 (2014.10.28)
출원국
미국
협약과제
초록
Provided are a photomultiplier and a manufacturing method thereof. The manufacturing method thereof may include forming a mask layer on an active region of a substrate doped with a first conductive type, ion implanting a second conductive type impurity opposite to the first conductive type into the substrate to form a first doped region in the active region under the mask layer and an non-active region exposed from the mask layer, forming a device isolation layer on the non-active region, removing the mask layer, and ion implanting the second conductive type impurity having a concentration higher than that of the first doped region into an upper portion of the first doped region in the active region to form a second doped region shallower than the first doped region.
KSP 제안 키워드
Device isolation, Isolation layer, Manufacturing method, Mask layer, active region