이온 발생용 타깃 및 이를 이용한 치료 장치
정문연, 표현봉, 김승환, 박형주, 신동호, 이황운, 박선희
- 8835870 (2014.09.16)
- Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened.
- KSP 제안 키워드
- Inner wall, Ion Beam, Laser beams, ion beam treatment, thin film(TF)