상세정보
등록 중이온 빔 발생 방법
- 출원번호
- 14534076 (2014.11.05)
- 공개번호
- 20150123009 (2015.05.07)
- 등록번호
- 9117619 (2015.08.25)
- 출원국
- 미국
- 협약과제
- 13VC1600, 종양치료용 레이저 이온 가속 시스템 원천 기술 개발, 정문연
- 초록
- There is provided a device for generating a heavy-ion beam. The device includes a laser beam generating unit configured to generate a laser beam; a target configured to generate a heavy-ion beam by the laser beam; a laser optical system configured to focus the laser beam on the front of the target; and a plasma treating unit disposed at a rear surface of the target and configured to remove impurities within the target by plasma surface treatment that is performed by radiating cationic plasma onto the rear surface of the target.
- KSP 제안 키워드
- Heavy ion, Heavy-ion beam, Ion Beam, Laser beams, Plasma surface treatment, Plasma treating, Surface treatments, generating unit, optical system, rear surface
- 패밀리
| 구분 | 특허 | 출원국 | KIPRIS |
|---|---|---|---|
| 등록 | 중이온 빔 발생 장치 및 방법 | 대한민국 | KIPRIS |