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특허 검색
구분 출원국
출원년도 ~ 키워드

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등록 반도체 소자 및 그 제조방법

반도체 소자 및 그 제조방법
이미지 확대
발명자
전치훈, 문재경, 장우진, 나제호, 배성범, 고상춘, 박영락, 남은수, 문석환
출원번호
14324724 (2014.07.07)
공개번호
20150194363 (2015.07.09)
등록번호
9337121 (2016.05.10)
출원국
미국
협약과제
13VB1700, 차세대 데이터센터용 에너지절감 반도체 기술, 남은수
초록
Provided are a semiconductor device and a method of fabricating the same. The semiconductor device includes: an active region provided on a substrate; an inlet channel formed as a single cavity buried in one side of the substrate; an outlet channel formed as a single cavity buried in the other side of the substrate; a micro channel array comprising a plurality of micro channels, wherein the plurality of micro channels are formed as a plurality of cavities buried in the substrate, and one end of the micro channel array is connected to a side of the inlet channel and the other end of the micro channel array is connected to a side of the outlet channel; and a micro heat sink array separating the micro channels from one another.
KSP 제안 키워드
Heat sink, Micro Heat Sink, Micro-channels, Outlet channel, active region, semiconductor device