상세정보
등록 레이저 기반 이온빔 갠트리 치료장치
- 출원번호
- 16007923 (2018.06.13)
- 공개번호
- 20180361173 (2018.12.20)
- 등록번호
- 10603517 (2020.03.31)
- 출원국
- 미국
- 초록
- Provided is an ion beam treatment apparatus. The ion beam treatment apparatus includes a laser generation unit, a dividing part dividing a pulse laser beam generated in the laser generation unit into a first laser beam and a second laser beam, a first target part receiving the first laser beam from the dividing part to generate a first ion beam, a second target part receiving the second laser beam from the dividing part to generate a second ion beam, a first path adjusting part adjusting a path of the first ion beam to irradiate the first ion beam to a treated patient, and a second path adjusting part adjusting a path of the second ion beam to irradiate the second ion beam to the treated patient.
- KSP 제안 키워드
- Generation unit, Ion Beam, Laser beams, Laser generation, Pulse laser, ion beam treatment
- 패밀리
| 구분 | 특허 | 출원국 | KIPRIS |
|---|---|---|---|
| 등록 | 이온 빔 치료장치 | 대한민국 | KIPRIS |