ETRI-Knowledge Sharing Plaform

Active Layer Oxide Tfts Gate Insulator Subthreshold Swing(SS) Amorphous Silicon Thin-Film Transistors(a-Si TFTs) High Performance Emitter Arrays Field-Effect Mobility Threshold Voltage(Vth) Transparent Thin Film Transistor(TTFT) Zno Thin Films Field Emitter Array Post-Annealing Glass Substrate Al-Zn Drain Current Field Emission Display Room-Temperature Bias Stability 3 V Zn-Sn-O(ZTO) High Voltage Turn-On Voltage Oxide Thin Films Oxide Material Device Characteristics Dielectric Layer Zinc Tin Oxide 60 Ghz Band Electrical Performance Highly Conductive Non-Volatile Memory(NVM) Wet Etching Process High-Density Vdf-Trfe Channel Layer Good Stability Plastic Substrate Organic-Inorganic Hybrid Dc Magnetron Sputtering Electron Beam Electroabsorption Modulator(EAM) Impedance Matching First Stokes(S1) Active Matrix Bias Stress Aperture Ratio Igzo Tfts Shield Layer Thin Film Deposition Current Stress Electronics Properties Memory Device Plasma Display Panel Radio-Over-Fiber Link Silicon Oxide Vth Shift Tail States Transparent Electrode Electrical Characteristics Heat-Treated Low Voltage Organic Thin-Film Transistors (Otfts) P-Type Superlattice Thin Films Transparent Electronics Control Device Transparent Display Cu-Doped Zno Dual Gate(DG) Gas Mixture Inkjet Printing On-Current Pulsed Laser Ablation(PLA) Si Etching Solution-Processed Vinylidene Fluoride-Co-Hexafluoropropylene(Poly) Ti-Doped Ito AM-OLED Annealing Conditions Active Channel Etching Method Etch Selectivity Gate Electrode Interfacial Trap Pressure Control Surface Layer Tft Array Analytical Modeling Electronic Transport Properties Pseudomorphic High Electron Mobility Transistor(pHEMT) Information And Communication Initialization Vector(IV) Light Shield Organic Vapor Semiconductor Bridge(SCB) 5 Nm Constant Current(CC) Conductive Oxide Fabrication Process Flexible Display Gate Leakage Current Mg-Doped Zno Oled Display Passivation Layer Thermal Stability(TGA) Zno Nanoparticle Atomic Ratio Al-Doped And Gate Bottom Gate Structure Back Channel Carrier Concentration Carrier Density Electronic Structures Ito Film Low Power Consumption On/Off Current Ratio 5.8 Ghz Zinc Oxide(ZnO) Device Applications Fabrication And Characterization Gate Voltage Gate Bias High Temperature Isolation Technology Power Device Monolithically Integrated Zno Layer X-Ray Diffraction Pattern Tips-Pentacene As Doping Bias Dependence Cathode Ray Tube Cross-Talk Channel Structure Combinatorial Method Contact Resistance(73.40.Cg) Compact Size Device Configuration Device Stability Discharging Voltage Electronic Characteristics Effective Production Electronic Systems Electron Temperature Formation Process Films Properties Flexible Device High Strain Hybrid Gate Dielectric Indium-Free Light-Emitting Diode(LED) Microelectronic Devices Parasitic Capacitance Protection Layer Optical Emission Spectra Photolithography Process Process Temperature Patterning Method Response Time Rf Isolation Wurtzite Structure Wet Chemical Visible Light Wafer Level Package Working Gas Ultra-Thin Top-Gate Structure Sn-Rich Temperature Stability High-Purity Two-Wavelength Vacuum Packaging Uniformly Distributed 13-Bis(Triisopropylsilylethynyl) Pentacene 10 Kv Zno Semiconductor Xrd Measurements X-Ray Photoelectron Spectroscopy (Xps) Zn Oxide Zinc-Doped Amorphous Igzo Blue Shift Crystal Structure Channel Density Coplanar Structure Driver Circuit Double Layered Emitting Diodes Earth-Abundant Materials Flexible Thin Film Transistors Field Emission Properties Flat Plate High Mobility Transistor Heat Treatment Process High Potential Insulator Layer Integrated Circuit Technology Interface Formation Poly-4-Vinylphenol Local Oscillator Low-Temperature Solution Process Triode Operation Next-Generation Oled Lighting Oxide Electrode Need For Negative Voltage Novel Technique Operation Speed Plasma Power Polarization State Pulsed-Laser Deposition(PLD) Red Emitting Rise Time Radio Link STRETCHABLE ELECTRONICS Saturation Mobility Sol-Gel-Derived Up-Conversion Mixer Two-Step Emission Characteristics Transmission Characteristics Zinc Indium Oxide Vertical Channel Coupled-Cavity Cross-Sectional Area(CSA) Cutoff Frequency Current Response Current-Voltage (I-V) Characteristics Cost-Effective Dual Function Dielectric Films E-Beam Electrical Stability Electrical Bias Field-Effect Transistors(FETs) Facile Route Germanium Silicon Alloys Hydrogenated Amorphous Silicon High-Resolution Helicon Plasma Inductively-Coupled Plasma(ICP) Memory Window Layer Effect Low-Temperature Process Large-Area Electronics Modulation Scheme Negative Shift Nano-Crystalline Nonvolatile Ferroelectric Memory Organic Light-Emitting Device(OLED) Oxide Gate Oxide Channel Oxygen Partial Pressure Photo Resist Process Technique Programming Pulse Patterning Technology Pico-Cell Radio-Over-Fiber (Rof) Link Radio Transmitter Stability And Performance Subthreshold Slope(SS) Surface Morphology Sodium Beta Alumina Sn-Doped Surface Composition White Light Ti Thin Film Silicon Semiconductor Trap Density Voltage Scan 200 Ghz Trap Sites Turn-On Field Atomic Layer Deposition Method Anode Voltage Band-Gap Energy Co-Sputtering Cu Concentration Driving Capability Doping Agents Doped Zno Films Dielectric Isolation Emission Spectroscopy Fiber Grating Field Enhancement Factor Gate Dielectric Film Halogen Lamp Hybrid Dielectric Metal Oxide Thin-Film Transistors Large Area Deposition Model-Based N-Type Doping Optoelectrical Properties Organic Passivation Plasma Process Photo Response Radio Frequency (Rf) Magnetron Sputtering Stable Structure Self-Aligned Surface Roughness Waveguide Photodiodes(WGPD) Wet And Dry Etching Threshold Electric Field Transparent Conductive Undoped Zno Thermal Properties Source/Drain Electrodes 20 Nm Traveling-Wave Electrode Aging Process Current Consumption Current Measurement Cathode Electrode Circuit Architecture Dc-Dc Converters Dimensional Structure Device Performance Exponential Distribution Electronic Properties Etching Behavior Edge Shape Film Density Gate Stack High Durability Hard Metal Ingazno Tfts Ionized Physical Vapor Deposition(IPVD) 7 Mm Microstrip Bandpass Filter Light Sources Light Irradiation Local Dimming Low Electric Field Matrix Field Microstrip Filters Mg Doping One-Step Synthesis O 2 Processing Temperature Protective Layer Pl Intensity Rf Performance Read-Out Sin X Scattering Parameters(S-parameters) Stability Characteristics Solid Solutions Sb-Doped Voltage-Dependent Voltage Sweep T-Gate Semiconductor Films Algaas/Ingaas/Gaas Phemts Amorphous Oxide Semiconductor Aqueous Solution Comparative Study Cross-Linked CNT-FED Conversion Gain Continuum Emission Device Size External Bias Fowler-Nordheim Plots High Linearity Hybrid Thin Film Heterojunction Bipolar Transistors(HBTs) Hybrid Type High Current Density Intermediate Frequency Limiting Amplifier Maximum Oscillation Frequency Mild Conditions Maximum Diameter On-Board Equipment Organic Semiconductor Power Amplifiers(PAs) Operation Characteristics Process Technology Power Ic Physical Model Required Duration Short Channel Specific On-Resistance Sonochemical Process Self-Focusing Wlan Applications Transparent Substrate Solution-Processable Thermal Activation Energy Direct Current(DC) Compensation Effect Ambient Conditions Breakdown Voltage(BDV) Current On-Off Ratio Charge Injection Design And Build Display Driver Gate Recess Growth Characteristics Indium Tin Oxide(ITO) 77.80.-E Low Noise Amplifier (Lna) Low Annealing Temperature Memory Cell Metal Electrode Novel Process Optoelectronic Devices On-Wafer Optical Characteristics Plasma Temperature Plasma Effects Rf Packaging Single Supply Stress Test Si-Based Switching Device Sige Hbt Silicon-Germanium(SiGe) Tungsten Electrode Trapping Behavior Transparent Oxide 5 Ghz 5 Mol%(MgO) 16 Quadrature Amplitude Modulation(16QAM) 2.4 Ghz Amorphous Zno Blocking Voltage Cell Density Carbon Nanotubes Patterning Cathode And Anode Channel Length Disturb-Free Dielectric Materials Doping Ratio Driving Circuit Feature Size Flexible Substrate Final Heat Treatment High Speed High Frequency(HF) Highly Transparent Igzo Thin Film 2.3 Ghz Lift-Off Process Memory Array Overall Performance Optical Transmission System Organic Binder Performance Parameters Printing Method Photo-Current Rf Transmitter Solution-Based Process Screen Printing Semiconductor Materials Surface Treatments Supply Voltage Structural And Optical Properties White Led Transparent Tft Thermal Annealing Ti Doping Ti Film