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학술지 Fabrication of Micro-Lens Arrays with Moth-Eye Antireflective Nanostructures using Thermal Imprinting Process
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저자
오상순, 최춘기, 김용성
발행일
201011
출처
Microelectronic Engineering, v.87 no.11, pp.2328-2331
ISSN
0167-9317
출판사
Elsevier
DOI
https://dx.doi.org/10.1016/j.mee.2010.03.012
협약과제
09SB1100, 메타물질 기반 나노분해능 이미징 시스템 기술개발, 최춘기
초록
We fabricated micro-lens arrays which have moth-eye antireflective nanostructures on their surfaces using thermal imprinting process and plasma treatment and characterized the morphology of the micro-lens arrays. After a micro-lens array shape was fabricated on a photoresist using photolithography and thermal reflow process, patterns were transferred onto a Ni stamp, and then micro-lens patterns were replicated on a polycarbonate film using thermal imprinting lithography. Using reactive ion etching, we were able to form the moth-eye antireflective nanostructures on the surface of polycarbonate films and polycarbonate micro-lens arrays. The AFM and SEM images of the plasma treated samples clearly show that the moth-eye nanostructures are formed on the surface. By measuring the transmittance spectrum using a UV-visible spectrometer, we also show that the moth-eye structures really act as antireflection coatings. © 2010 Elsevier Ltd. All rights reserved.
키워드
Antireflection, Micro-lens arrays, Nanoimprint lithography
KSP 제안 키워드
AFM and SEM, Imprinting Lithography, Microlens array, Moth-eye structure, Reactive ion etching(RIE), Reflow process, SEM images, Transmittance spectrum, UV-Visible, antireflection coating, nanoimprint lithography