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학술지 Simplifying Patterning Process of ZnO Nanowires by One Step Development and Etching Process
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저자
김용희, 백남섭, 김국화, 정상돈
발행일
201212
출처
Journal of Sol-Gel Science and Technology, v.64 no.2, pp.304-308
ISSN
0928-0707
출판사
Springer
DOI
https://dx.doi.org/10.1007/s10971-012-2858-8
협약과제
11SC1400, 인공망막 이식용 생체적합성 나노-바이오 다중전극어레이 칩 기술 개발, 정상돈
초록
We present herein a simple protocol of growing a patterned ZnO nanowire by etching of ZnO seed layer in the tetramethyl ammonium hydroxide (TMAH) solution. The ZnO seed layer was fabricated by sol-gel method using zinc acetate solution and patterned by using photolithographic method. Patterned ZnO seed layer as etched in the TMAH solution, followed by growth of ZnO nanowires by hydrothermal method. Remarkable point of present ZnO seed layer patterning is that development of UV-exposed photoresist and etching of ZnO seed layer is subsequently processed in aqueous TMAH solution without interruption. The grown ZnO nanowires were analyzed using XRD patterns to exhibit high purity and degree of crystallinity, and showed very good pattern fidelity. © 2012 Springer Science+Business Media, LLC.
키워드
Hydrothermal method, Patterned growth, Tetramethylammonium hydroxide, ZnO nanowire
KSP 제안 키워드
Etching process, High-purity, One-step, Pattern fidelity, Patterning process, TMAH solution, Tetramethylammonium hydroxide, XRD patterns, Zinc acetate, ZnO nanowire, ZnO seed layer