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Journal Article Performance Improvement in Silicon Arrayed Waveguide Grating by Suppression of Scattering Near the Boundary of a Star Coupler
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Authors
Jaegyu Park, Gyungock Kim, Hyundai Park, Jiho Joo, Sanggi Kim, Myung-Joon Kwack
Issue Date
2015-06
Citation
Applied Optics, v.54, no.17, pp.5597-5602
ISSN
1559-128X
Publisher
Optical Society of America (OSA)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1364/AO.54.005597
Project Code
14MB1300, Silicon Nanophotonics-based next-generation computer interface platform, Kim Gyungock
Abstract
We investigate the reduction of transition loss across the star coupler boundary in a silicon arrayed waveguide grating (AWG) by suppressing multimode generation and scattering near the boundary of a star coupler. Eightchannel silicon AWGs were designed with optimal conditions based on enhanced field matching in combination with ultrashallow etched structures. The fabricated AWG demonstrates an insertion loss down to 0.63 dB with a cross talk of -23 to -25.3 dB, exhibiting ~0.8 dB improvement of insertion loss and ~4 dB improvement of cross talk compared to the Si AWG fabricated with a conventional double-etch technique.
KSP Keywords
Cross Talk, Enhanced field, Field matching, Optimal conditions, Transition loss, arrayed waveguide grating(AWG), insertion loss, performance improvement