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학술지 Micro-Electro-Mechanical-Systems-Based Infrared Spectrometer Composed of Multi-Slit Grating and Bolometer Array
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저자
양재창, 정호, 이광준, 강진영, 구진근, 박종문, 박건식, 공성호
발행일
200808
출처
Japanese Journal of Applied Physics, v.47 no.8, pp.6943-6948
ISSN
0021-4922
출판사
Japan Society of Applied Physics (JSAP), Institute of Physics (IOP)
DOI
https://dx.doi.org/10.1143/JJAP.47.6943
협약과제
08MB1300, IT융복합 공동시험환경구축, 강진영
초록
A micro-electro-mechanical-systems (MEMS)-based IR spectrometer has been designed and fabricated. The proposed micro-spectrometer consists of multi-slit grating and bolometric IR detector array. The grating is used for dispersion of an incident optical radiation into different wavelength components. The grating structure is patterned by reactive ion etching (RIE) of aluminum deposited on dielectric membrane, which is fabricated over silicon wafer. The IR detector part adopts a resistive bolometer that changes its resistance due to the temperature increment. The presence of IR at the specific wavelength can be detected by noticing the resistance change when temperature increases due to an incident IR ray. Vanadium oxide is adopted for resistive bolometer of IR spectrometer in this work because of its higher temperature coefficient of resistance (TCR) which is needed for the better sensitivity. Two parts that composes the MEMS-based IR spectrometer, aluminum multi-slit grating and thermal-type vanadium oxide IR detector, are processed independently and bonded as a final step. © 2008 The Japan Society of Applied Physics.
키워드
Grating, IR, MEMS, Spectrometer, Vanadium oxide
KSP 제안 키워드
Applied physics, Grating structure, IR detector, Infrared spectrometer, MEMS-based, Micro-electro-mechanical system(MEMS), Micro-spectrometer, Optical radiation, Reactive ion etching(RIE), Resistance change, Silicon wafer