ETRI-Knowledge Sharing Plaform

ENGLISH

성과물

논문 검색
구분 SCI
연도 ~ 키워드

상세정보

학술지 Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition
Cited 9 time in scopus Download 0 time Share share facebook twitter linkedin kakaostory
저자
임정욱, 윤선진, 김현탁
발행일
200808
출처
Japanese Journal of Applied Physics, v.47 no.8, pp.6934-6937
ISSN
0021-4922
출판사
Japan Society of Applied Physics (JSAP), Institute of Physics (IOP)
DOI
https://dx.doi.org/10.1143/JJAP.47.6934
협약과제
08MB3100, 전기적 점프(Current Jump)를 이용한 신소자 기술, 김현탁
초록
AlxTi1-xOy (ATO) films were deposited by plasma enhanced atomic layer deposition (PEALD). In the deposition, it was possible to tailor the refractive index and the thickness of films by adjusting the number of cycles used for Al2O3 and TiO2 sublayers. Because optical thickness can be controlled, ATO films will be applicable to optical filters, high reflectivity coating layers and antireflection coating layers. © 2008 The Japan Society of Applied Physics.
키워드
Antireflection coating, ATO, PEALD
KSP 제안 키워드
Applied physics, High reflectivity, Optical filters, Optical thickness, Plasma-enhanced atomic layer deposition, antireflection coating, number of cycles, refractive index