ETRI-Knowledge Sharing Plaform

ENGLISH

성과물

논문 검색
구분 SCI
연도 ~ 키워드

상세정보

학술지 Characteristics of W- and Ti-Doped VO2 Thin Films Prepared by Sol-Gel Method
Cited 49 time in scopus Download 0 time Share share facebook twitter linkedin kakaostory
저자
채병규, 김현탁, 윤선진
발행일
200804
출처
Electrochemical and Solid-State Letters, v.11 no.6, pp.D53-D55
ISSN
1099-0062
출판사
Electrochemical Society (ECS)
DOI
https://dx.doi.org/10.1149/1.2903208
협약과제
08MB3100, 전기적 점프(Current Jump)를 이용한 신소자 기술, 김현탁
초록
W- and Ti-doped V O2 thin films were deposited onto sapphire by the sol-gel method. Both films were grown with (020)-preferred direction. Doping of W had a great effect on the transition behaviors. A 1.2 atom % W-doped V O2 film showed a largely reduced resistance in the insulator state and decreased the transition temperature to 313 K. However, Ti-doped V O2 film had a little change of the transition temperature, and it was 350 K, even for the 20 atom % Ti doping. The resistance in the metal state was very large, which means a markedly small change of the resistance at the transition temperature. Further study is required for understanding the effects of doping V O2 film with metal ions. © 2008 The Electrochemical Society.
KSP 제안 키워드
Metal ion, Metal state, Small change, Ti doping, Ti-doped, W-doped, sol-gel method, thin film(TF), transition temperature