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학술지 Patterning of Conducting Polymers Using Charged Self-Assembled Monolayers
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저자
정미희, 이효영
발행일
200809
출처
Langmuir, v.24 no.17, pp.9825-9831
ISSN
0743-7463
출판사
American Chemical Society(ACS)
DOI
https://dx.doi.org/10.1021/la8014207
협약과제
07SB1100, 기능성 분자메모리 소재 개발 및 소자구현 연구, 이효영
초록
We introduce a new approach to pattern conducting polymers by combining oppositely charged conducting polymers on charged self-assembled monolayers (SAMs). The polymer resist pattern behaves as a physical barrier, preventing the formation of SAMs. The patterning processes were carried out using commercially available conducting polymers: a negatively charged PEDOT/PSS (poly(3,4-ethylene-dioxythiophene)/poly(4-stylenesulphonic acid)) and a positively charged polypyrrole (PPy). A bifunctional NH2 (positively charged) or COOH (negatively charged) terminated alkane thiol or silane was directly self-assembled on a substrate (Au or SiO2). A suspension of the conducting polymers (PEDOT/PSS and PPy) was then spin-coated on the top surface of the SAMs and allowed to adsorb on the oppositely charged SAMs via an electrostatic driving force. After lift-off of the polymer resist, i.e., poly(methyl methacrylate, PMMA), using acetone, the conducting polymers remained on the charged SAMs surface. Optical microscopy, Auger electron spectroscopy, and atomic force microscopy reveal that the prepared nanolines have low line edge roughness and high line width resolution. Thus, conducting polymer patterns with high resolution could be produced by simply employing charged bifunctional SAMs. It is anticipated that this versatile new method can be applied to device fabrication processes of various nano- and microelectronics. © 2008 American Chemical Society.
KSP 제안 키워드
Alkane thiol, Atomic force microscope(AFM), Auger Electron Spectroscopy, Conducting polymers, Driving forces, High-resolution, Line edge roughness, Line width, Nano-, Negatively charged, New approach