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학술지 Low-Temperature Synthesis of Thin Graphite Sheets Using Plasma-Assisted Thermal Chemical Vapor Deposition System
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저자
Byeong-Joo Lee, Taeg-Woo Lee, Serin Park, 유한영, Jeong-O Lee, Sung-Hwan Lim, 정구환
발행일
201104
출처
Materials Letters, v.65 no.7, pp.1127-1130
ISSN
0167-577X
출판사
Elsevier
DOI
https://dx.doi.org/10.1016/j.matlet.2011.01.045
협약과제
11MC1500, 차세대 IT기반 기술사업화 기반조성, 장원익
초록
We report the low-temperature synthesis of thin graphite sheets using a hybrid chemical vapor deposition (HCVD) system that combines plasma and thermal CVD (TCVD). Electron beam deposited Ni films were used as catalytic substrates, and methane was used as a carbon feedstock. The quartz tube was into two regions: core plasma region for efficient dissociation of methane and a TCVD region for thermal synthesis, respectively. After the syntheses at different TCVD temperatures from 550 °C to 900 °C, as-grown films were transferred to transparent polymeric substrates to apply as flexible conductive electrodes. Finally, it was found that thin graphite sheets consisting of ~ 15 graphene layers were synthesized at 600 °C using the HCVD system and could be applicable as transparent conductive films. © 2011 Elsevier B.V. All rights reserved.
키워드
Low temperature synthesis, Plasma-assisted CVD, Thin graphite sheets, Transparent flexible conductive films
KSP 제안 키워드
As-grown, Chemical Vapor Deposition, Chemical vapour deposition(CVD), Electron Beam, Graphene layer, Low temperature(LT), Low-temperature synthesis, Ni films, Plasma-assisted CVD, Quartz tube, Thin graphite sheets