ETRI-Knowledge Sharing Plaform

KOREAN
논문 검색
Type SCI
Year ~ Keyword

Detail

Conference Paper Development of Stacking Process for 3D TSV (Through Silicon Via) Structure using Laser
Cited - time in scopus Share share facebook twitter linkedin kakaostory
Authors
Kwang-Seong Choi, Wagno Alves Braganca Junior, Keon-Soo Jang, Hyun-Cheol Bae, Yong-Sung Eom
Issue Date
2017-12
Citation
International Microelectronics Assembly and Packaging Society (IMAPS) 2017, pp.1-5
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.4071/isom-2017-TP31_027
Abstract
TSV chips were designed and fabricated to investigate the effects of the types of the stacking process on the manufacturability. Two processes were compared: thermocompression and laser bonding. The pitch of UBMs, solder bumps, and TSVs were 50μm. A fluxing underfill was developed and used as a pre-applied underfill during the stacking process. The bonding profiles and the solder joint morphology based on the thermocompression and the laser bonding were compared.