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Conference Paper Development of Stacking Process for 3D TSV (Through Silicon Via) Structure using Laser
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Authors
Kwang-Seong Choi, Wagno Alves Braganca Junior, Keon-Soo Jang, Hyun-Cheol Bae, Yong-Sung Eom
Issue Date
2017-12
Citation
International Microelectronics Assembly and Packaging Society (IMAPS) 2017, pp.1-5
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.4071/isom-2017-TP31_027
Abstract
TSV chips were designed and fabricated to investigate the effects of the types of the stacking process on the manufacturability. Two processes were compared: thermocompression and laser bonding. The pitch of UBMs, solder bumps, and TSVs were 50μm. A fluxing underfill was developed and used as a pre-applied underfill during the stacking process. The bonding profiles and the solder joint morphology based on the thermocompression and the laser bonding were compared.
KSP Keywords
3D TSV, Joint morphology, Laser bonding, Solder bump, Solder joint, Through silicon vias(TSV)