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학술지 Proposal of 28 GHz InVitro Exposure System Based on Field Uniformity for Three-Dimensional Cell Culture Experiments
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저자
이영승, 정재영, 전상봉, 이애경, 최형도
발행일
201910
출처
Bioelectromagnetics, v.40 no.7, pp.445-457
ISSN
0197-8462
출판사
Wiley
DOI
https://dx.doi.org/10.1002/bem.22215
협약과제
19HR3900, 복합 전파환경에서의 국민건강 보호 기반 구축 사업, 최형도
초록
This paper proposes a novel in vitro exposure system operating at millimeter-wave (mmWave) 28 GHz, one of the frequency bands under consideration for fifth generation (5G) communication. We employed the field uniformity concept along cross-sectional observation planes at shorter distances from the radiation antenna for better efficiency and a small-size system. A choke-ring antenna was designed for this purpose in consideration of a wider beamwidth (BW) and a symmetric far-field pattern across three principal planes. The permittivity of Dulbecco's modified Eagle's medium solution was measured to examine the specific absorption rate (SAR) of the skin cell layer inside a Petri dish model for a three-dimensional (3D) cell culture in vitro experiment. The best deployment of Petri dishes, taking into account a geometrical field symmetry, was proposed. Local SAR values within the cell layer among the Petri dishes were determined with different polarization angles. It was determined that this polarization effect should be considered when the actual exposure and deployment were conducted. We finally proposed an in vitro exposure system based on the field uniformity including downward exposure from an antenna for 3D cell culture experiments. A small-size chamber system was obtained, and the size was estimated using the planar near-field chamber design rule. Bioelectromagnetics. 2019;40:445??457. © 2019 Bioelectromagnetics Society.
키워드
3D cell culture, field uniformity, in vitro exposure, millimeter-wave, polarization effect
KSP 제안 키워드
28 GHz, Cell culture in vitro, Cross-sectional observation, Design rule, Fifth Generation(5G), SAR values, Three-dimensional (3D) cell culture, Three-dimensional cell culture, based on the field, far-field pattern, field uniformity