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학술지 A Thin Film Encapsulation Layer Fabricated via Initiated Chemical Vapor Deposition and Atomic Layer Deposition
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저자
김봉준, 김도형, 강승열, 안성덕, 임성갑
발행일
201412
출처
Journal of Applied Polymer Science, v.131 no.24, pp.1-7
ISSN
0021-8995
출판사
John Wiley & Sons
DOI
https://dx.doi.org/10.1002/app.40974
협약과제
14MB1400, 미래광고 서비스를 위한 에너지절감형 환경적응 I/O (Input/Output) 플랫폼 기술 개발, 황치선
초록
An organic/inorganic hybrid multilayer for encapsulation of organic electronic devices is developed, where the organic polymer layer and the inorganic layer are alternatively deposited by initiated chemical vapor deposition and atomic layer deposition processes, respectively. The thickness of each organic and inorganic layer is optimized to minimize the water vapor transmission rate (WVTR) determined by a Ca test. The produced barrier film shows an outstanding optical property as its light transmittance is average 89.42% at visible light region. The WVTR of the developed thin film encapsulation layer is as low as 2.17 × 10-4 g m-2 day-1 at 38°C, 90% relative humidity (RH). This value is equivalent to 1.29 × 10-5 g m-2 day-1 at ambient condition, which is sufficient to elongate the lifetime of organic electronic devices.
키워드
Films, Property relations, Radical polymerization, Structure
KSP 제안 키워드
As 2, Atomic Layer Deposition, Barrier film, Encapsulation layer, Initiated Chemical Vapor Deposition, Light transmittance, Organic-inorganic hybrid, Property relations, Radical polymerization, Relative Humidity, Thin film encapsulation