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Journal Article
The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma
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- Authors
- Jong-Chang Woo, Chang-Auck Choi, Young-Hee Joo, Han-Soo Kim, Chang-Il Kim
- Issue Date
- 2013-04
- Citation
- Transactions on Electrical and Electronic Materials, v.14, no.2, pp.67-70
- ISSN
- 1229-7607
- Publisher
- 한국전기전자재료학회
- Language
- English
- Type
- Journal Article
- KSP Keywords
- Ar plasma, Inductively coupled, dry etching, thin film(TF)