ETRI-Knowledge Sharing Plaform



논문 검색
구분 SCI
연도 ~ 키워드


학술지 Electrical and Optical Properties of Radio Frequency Magnetron-Sputtered Lightly Aluminum-Doped Zinc Oxide Thin Films Deposited in Hydrogen-Argon Gas
Cited 4 time in scopus Download 0 time Share share facebook twitter linkedin kakaostory
김경현, 최해원, 조대형, 정용덕, 이규석, 박래만, 김제하
Thin Solid Films, v.540, pp.142-145
We studied the electrical and optical properties of lightly aluminum-doped zinc oxide (L-AZO) films, which were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering using a 0.2 wt.% aluminum-doped zinc oxide target and a 0.3 wt.% hydrogen-mixed argon (Ar/0.3% H2) gas. The L-AZO films were characterized in terms of structural, optical, and electrical properties by X-ray diffraction, ultraviolet-visible spectrophotometry, photoluminescence and Hall measurements at room temperature. The Al contents of the L-AZO film were analyzed with secondary ion mass spectroscopy. As the Ar/0.3%H2 gas flow was increased up to 200 sccm, the transmittance and conductivity of the film simultaneously improved as a function of the increasing flow rate without additional thermal or gas treatment. The 40 nm-thick L-AZO film, which was deposited by an Ar/0.3% H 2 gas flow of 200 sccm at a substrate temperature of 100°C, had a carrier concentration of 1.0 × 1020/cm3, resistivity of 5.5 × 10-3 廓-cm, and an average transmittance of 93% in the wavelength range from 300 nm to 2000 nm. © 2013 Elsevier B.V. All rights reserved.
KSP 제안 키워드
40 nm, AZO film, Al contents, Aluminum-doped zinc oxide thin films, Argon gas, Carrier concentration, Electrical and optical properties, Field effect transistors(Substrate temperature), Flow rate, Gas flow, Gas treatment