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Journal Article General Route to Single-Crystalline SnO Nanosheets on Arbitrary Substrates
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Authors
Brijesh Kumar, Deuk-Hee Lee, Sang-Hyeob Kim, Beelyong Yang, Sunglyul Maeng, Sang-Woo Kim
Issue Date
2010-07
Citation
The Journal of Physical Chemistry C, v.114, no.25, pp.11050-11055
ISSN
1932-7447
Publisher
American Chemical Society(ACS)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1021/jp101682v
Project Code
09SC1400, Development of the visual biomimetic device and cognitive system technology, Chung Myung-Ae
Abstract
Novel pure tin monoxide (SnO) nanosheets for use in future functional nanoscale devices were produced on indium tin oxide/glass and SiO2/Si substrates by a thermal chemical vapor deposition process without the use of catalysts or a vacuum system. The SnO nanosheets were grown purely on the substrates without the coexistence of other nanostructures. High-resolution transmission electron microscopy investigations revealed that the structurally uniform SnO nanosheets without planar defects that were produced had preferred growth directions of 짹[110] and 짹[1??10] as well as a single-crystalline tetragonal structure. This work provides a general route for the facile synthesis of single-crystalline SnO nanosheets on arbitrary substrates with single, poly, or amorphous crystal structures. In addition, the selective formation of SnO nanosheets on Pt-deposited patterned SiO 2/Si substrates was successfully accomplished. © 2010 American Chemical Society.
KSP Keywords
Amorphous crystal, Chemical vapor deposition process, Chemical vapour deposition(CVD), Nanoscale devices, Planar defects, Preferred growth, Pure tin, Selective formation, Si substrate, SiO 2, Single-crystalline