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Conference Paper Temperature-insensitive silicon ring fabricated by DUV lithography and overlaid with highly negative thermo-optic TiO<inf>2</inf>
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Authors
Jong Moo Lee
Issue Date
2014-08
Citation
International Conference on Group IV Photonics (GFP) 2014, pp.67-68
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.1109/Group4.2014.6962023
Abstract
Temperature-dependent spectral variations of 5μm-radius silicon ring resonators, which are fabricated by deep ultra-violet (DUV) lithography and overlaid by air, silica and highly negative thermo-optic TiO2, respectively, are compared by experiment.
KSP Keywords
DUV lithography, Ring resonator, Silicon ring, Temperature-dependent, Thermo-optic, Ultra-violet, temperature-insensitive