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Journal Article
Postfabrication Trimming of CMOS-Compatible Athermal MZI by Thermal Annealing
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- Authors
- Jong-Moo Lee, Min-su Kim, Maryse Fournier, Pierre Labeye, Claudio J. Oton, Francesco Testa
- Issue Date
- 2016-02
- Citation
- IEEE/OSA Journal of Lightwave Technology, v.34, no.4, pp.1288-1292
- ISSN
- 0733-8724
- Publisher
- IEEE, OSA
- Language
- English
- Type
- Journal Article
- Abstract
- CMOS-compatible athermal MZI is postfabrication trimmed in wavelength from -0.15 to -5.15 nm using thermal annealing process from 400 to 530 °C. The MZI filter shows temperature dependence less than 2 pm/°C and the temperature dependence is maintained after the annealing process.
- KSP Keywords
- 5 nm, CMOS-compatible, Thermal annealing, annealing process, temperature dependence