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학술지 Postfabrication Trimming of CMOS-Compatible Athermal MZI by Thermal Annealing
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저자
이종무, 김민수, Maryse Fournier, Pierre Labeye, Claudio J. Oton, Francesco Testa
발행일
201602
출처
IEEE/OSA Journal of Lightwave Technology, v.34 no.4, pp.1288-1292
ISSN
0733-8724
출판사
IEEE, OSA
DOI
https://dx.doi.org/10.1109/JLT.2016.2515102
협약과제
15PB5900, 실리콘 포토닉스 기반 SDN용 12채널 4x8 광스위치 모듈 개발, 이종무
초록
CMOS-compatible athermal MZI is postfabrication trimmed in wavelength from -0.15 to -5.15 nm using thermal annealing process from 400 to 530 °C. The MZI filter shows temperature dependence less than 2 pm/°C and the temperature dependence is maintained after the annealing process.
KSP 제안 키워드
5 nm, CMOS-compatible, Thermal annealing, annealing process, temperature dependence