상세정보
학술지
Electrowetting Lens Employing Hemispherical Cavity Formed by Hydrofluoric Acid, Nitric Acid, and Acetic Acid Etching of Silicon
- 저자
- 이준규, 최주찬, 장원익, 김학린, 공성호
- 발행일
- 201208
- 출처
- Japanese Journal of Applied Physics, v.51 no.6 PART 2, pp.1-7
- ISSN
- 0021-4922
- 출판사
- Japan Society of Applied Physics (JSAP),
- 초록
- We demonstrate the design of an electrowetting lens employing a high-aspect-ratio hemispherical lens cavity and its micro-electro- mechanicalsystem (MEMS) fabrication process in this study. Our preliminary simulation results showed that the physical and electrical durability of the lens can be improved by the mitigation of stresses on the insulator at the hemispherical cavity. High-aspect-ratio hemispherical cavities with various diameters and very smooth sidewall surfaces were uniformly fabricated on a silicon wafer by a sophisticated isotropic wet etching technique. Moreover, we experimentally investigated the optical properties of the MEMS-based electrowetting lens with the proposed cavity. Two immiscible liquids in the proposed lens cavity were electrostatically controlled with negligible optical distortion and low focal-length hysteresis due to the fully axis-symmetrical geometry and smooth sidewall of the cavity. © 2012 The Japan Society of Applied Physics.
- KSP 제안 키워드
- Acetic acid(AA), Acid etching, Applied physics, Electrical durability, Electro-, Etching technique, Hemispherical cavity, High aspect ratio, Immiscible liquids, MEMS-based, Silicon wafer