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Electrowetting Lens Employing Hemispherical Cavity Formed by Hydrofluoric Acid, Nitric Acid, and Acetic Acid Etching of Silicon
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- Authors
- June Kyoo Lee, Ju Chan Choi, Won Ick Jang, Hak-Rin Kim, Seong Ho Kong
- Issue Date
- 2012-08
- Citation
- Japanese Journal of Applied Physics, v.51, no.6 PART 2, pp.1-7
- ISSN
- 0021-4922
- Publisher
- Japan Society of Applied Physics (JSAP),
- Language
- English
- Type
- Journal Article
- Abstract
- We demonstrate the design of an electrowetting lens employing a high-aspect-ratio hemispherical lens cavity and its micro-electro- mechanicalsystem (MEMS) fabrication process in this study. Our preliminary simulation results showed that the physical and electrical durability of the lens can be improved by the mitigation of stresses on the insulator at the hemispherical cavity. High-aspect-ratio hemispherical cavities with various diameters and very smooth sidewall surfaces were uniformly fabricated on a silicon wafer by a sophisticated isotropic wet etching technique. Moreover, we experimentally investigated the optical properties of the MEMS-based electrowetting lens with the proposed cavity. Two immiscible liquids in the proposed lens cavity were electrostatically controlled with negligible optical distortion and low focal-length hysteresis due to the fully axis-symmetrical geometry and smooth sidewall of the cavity. © 2012 The Japan Society of Applied Physics.
- KSP Keywords
- Acetic acid(AA), Acid etching, Applied physics, Electrical durability, Electro-, Etching technique, Fabrication process, Hemispherical cavity, High Aspect Ratio, Immiscible liquids, MEMS-based