상세정보
학술지
Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
- 발행일
- 201608
- 출처
- ETRI Journal, v.38 no.4, pp.675-684
- ISSN
- 1225-6463
- 출판사
- 한국전자통신연구원 (ETRI)
- 협약과제
- 15MB1800, 고효율 GaN 기반 기지국/단말기용 핵심부품 및 모듈 개발, 임종원
- 초록
- This paper demonstrates the effect of fluoride-based plasma treatment on the performance of Al2O3/AlGaN/GaN metal-insulator-semiconductor heterostructure field effect transistors (MISHFETs) with a T-shaped gate length of 0.20 μm. For the fabrication of the MISHFET, an Al2O3 layer as a gate dielectric was deposited using atomic layer deposition, which greatly decreases the gate leakage current, followed by the deposition of the silicon nitride layer. The silicon nitride layer on the gate foot region was then selectively removed through a reactive ion etching technique using CF4 plasma. The etching process was continued for a longer period of time even after the complete removal of the silicon nitride layer to expose the Al2O3 gate dielectric layer to the plasma environment. The thickness of the Al2O3 gate dielectric layer was slowly reduced during the plasma exposure. Through this plasma treatment, the device exhibited a threshold voltage shift of 3.1 V in the positive direction, an increase of 50 mS/mm in trans conductance, a degraded off-state performance and a larger gate leakage current compared with that of the reference device without a plasma treatment.
- KSP 제안 키워드
- Atomic Layer Deposition, Etching process, Etching technique, Field effect transistors(Substrate temperature), Fluoride-based plasma treatment, Gate Foot, Heterostructure field effect transistors, Metal-insulator-semiconductor(MIS), Nitride layer, Off-State, Reactive ion etching(RIE)