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Journal Article Fabrication of Antireflection Nanostructures by Hybrid Nano-Patterning Lithography
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Authors
Kang Younghun, Kang Younghun, 김용성, Choi Choon Gi
Issue Date
201002
Source
Microelectronic Engineering, v.87 no.2, pp.125-128
ISSN
0167-9317
Publisher
Elsevier
DOI
https://dx.doi.org/10.1016/j.mee.2009.06.006
Project Code
09MB4600, 나노 구조 무반사 필름 제작기술 개발, Choi Choon Gi
Abstract
Antireflection (AR) nanostructures are fabricated on a glass substrate using hybrid nano-patterning lithography (H-NPL) consisting of nanosphere lithography (NSL) and UV-nanoimprint lithography (UV-NIL). The shape and diameter of the AR nanostructures were controlled by fabricating Si masters with different RIE conditions. The shapes of the AR nanostructures were a pillar-type and a corn-type. The diameters of the AR nanostructures were about 350 and 250 nm, respectively. AR nanostructures were successfully nanoimprinted on glass in accordance with Si master prepared by NSL. The pillar-type AR nanostructure with diameter of 350 nm exhibited the transmittance of over 98% in the wavelength range from 1100 to 2200 nm. From the results, the fabricated AR nanostructures demonstrate the possibility to improve the efficiency of optoelectronic devices such as a photo-detector and an IR-LED. Crown Copyright © 2009.
KSP Keywords
Glass substrate, IR-LED, Nano-patterning, Nanosphere lithography(NSL), UV nanoimprint lithography, UV-NIL, optoelectronic devices, photo-detector, wavelength range