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Journal Article
Fabrication of Antireflection Nanostructures by Hybrid Nano-Patterning Lithography
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- Authors
- Young Hun Kang, Sang Soon Oh, Young-Sung Kim, Choon-Gi Choi
- Issue Date
- 2010-02
- Citation
- Microelectronic Engineering, v.87, no.2, pp.125-128
- ISSN
- 0167-9317
- Publisher
- Elsevier
- Language
- English
- Type
- Journal Article
- Abstract
- Antireflection (AR) nanostructures are fabricated on a glass substrate using hybrid nano-patterning lithography (H-NPL) consisting of nanosphere lithography (NSL) and UV-nanoimprint lithography (UV-NIL). The shape and diameter of the AR nanostructures were controlled by fabricating Si masters with different RIE conditions. The shapes of the AR nanostructures were a pillar-type and a corn-type. The diameters of the AR nanostructures were about 350 and 250 nm, respectively. AR nanostructures were successfully nanoimprinted on glass in accordance with Si master prepared by NSL. The pillar-type AR nanostructure with diameter of 350 nm exhibited the transmittance of over 98% in the wavelength range from 1100 to 2200 nm. From the results, the fabricated AR nanostructures demonstrate the possibility to improve the efficiency of optoelectronic devices such as a photo-detector and an IR-LED. Crown Copyright © 2009.
- KSP Keywords
- Glass substrate, IR-LED, Nano-patterning, Nanoimprint lithography(NIL), Nanosphere lithography, Optoelectronic devices, UV nanoimprint lithography(UV-NIL), Wavelength range, photo detector