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학술지 Nano-Scale Texturing of Borosilicate Glasses Using CF4-Based Plasma Discharge for Application in Thin film Solar Cells
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저자
김형수, 임정욱, 윤선진, 이현, 이희철
발행일
201204
출처
Journal of Nanoscience and Nanotechnology, v.12 no.4, pp.3464-3468
ISSN
1533-4880
출판사
American Scientific Publishers (ASP),
DOI
https://dx.doi.org/10.1166/jnn.2012.5565
협약과제
10MB6100, 광캡쳐 구조 반사방지막 및 조성기울기를 갖는 Si/SiGe 박막 태양전지 기술 개발, 윤선진
초록
Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF 4/O 2 and CF 4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83% and 6.82%, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment. © 2012 American Scientific Publishers.
키워드
Borosilicate glass, Plasma treatment, Solar cell, Surface reflection, Texturing
KSP 제안 키워드
Borosilicate glasses, CF 4, Gas flow ratio, Gas mixture, Glass substrate, Low RF power, O 2, Optical characteristics, Plasma discharge, Surface treatments, Thin film solar cells