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Journal Article Fine Neurite Patterns from Photocrosslinking of Cell-Repellent Benzophenone Copolymer
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Authors
Nam Seob Baek, Yong Hee Kim, Young Hwan Han, Andreas Offenhausser, Myung-Ae Chung, Sang-Don Jung
Issue Date
2012-08
Citation
Journal of Neuroscience Methods, v.210, no.2, pp.161-168
ISSN
0165-0270
Publisher
Elsevier,
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1016/j.jneumeth.2012.07.011
Project Code
11SF1700, Interfacing of Neurons and Receptors with Semiconductor Devices, Chung Myung-Ae
Abstract
We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ~77mW/cm2 at 280nm and ~60mW/cm2 at 365nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine. © 2012 Elsevier B.V.
KSP Keywords
L-lysine(Poly), Line width, Pattern fidelity, Poly-L-lysine, Poly-d-lysine, line pattern, oxidative damage