상세정보
학술지
Fine Neurite Patterns from Photocrosslinking of Cell-Repellent Benzophenone Copolymer
- 발행일
- 201208
- 출처
- Journal of Neuroscience Methods, v.210 no.2, pp.161-168
- ISSN
- 0165-0270
- 출판사
- Elsevier,
- 협약과제
- 11SF1700, 뉴런 및 수용체와 반도체 소자의 하이브리드 네트워크, 정명애
- 초록
- We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ~77mW/cm2 at 280nm and ~60mW/cm2 at 365nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine. © 2012 Elsevier B.V.
- KSP 제안 키워드
- L-lysine(Poly), Line width, Pattern fidelity, Poly-L-lysine, Poly-d-lysine, line pattern, oxidative damage