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Journal Article
Fine Neurite Patterns from Photocrosslinking of Cell-Repellent Benzophenone Copolymer
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- Authors
- Nam Seob Baek, Yong Hee Kim, Young Hwan Han, Andreas Offenhausser, Myung-Ae Chung, Sang-Don Jung
- Issue Date
- 2012-08
- Citation
- Journal of Neuroscience Methods, v.210, no.2, pp.161-168
- ISSN
- 0165-0270
- Publisher
- Elsevier,
- Language
- English
- Type
- Journal Article
- Abstract
- We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ~77mW/cm2 at 280nm and ~60mW/cm2 at 365nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine. © 2012 Elsevier B.V.