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Journal Article Simplifying Patterning Process of ZnO Nanowires by One Step Development and Etching Process
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Authors
Yong Hee Kim, Nam Seob Baek, Kook Hwa Kim, Sang-Don Jung
Issue Date
2012-12
Citation
Journal of Sol-Gel Science and Technology, v.64, no.2, pp.304-308
ISSN
0928-0707
Publisher
Springer
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1007/s10971-012-2858-8
Abstract
We present herein a simple protocol of growing a patterned ZnO nanowire by etching of ZnO seed layer in the tetramethyl ammonium hydroxide (TMAH) solution. The ZnO seed layer was fabricated by sol-gel method using zinc acetate solution and patterned by using photolithographic method. Patterned ZnO seed layer as etched in the TMAH solution, followed by growth of ZnO nanowires by hydrothermal method. Remarkable point of present ZnO seed layer patterning is that development of UV-exposed photoresist and etching of ZnO seed layer is subsequently processed in aqueous TMAH solution without interruption. The grown ZnO nanowires were analyzed using XRD patterns to exhibit high purity and degree of crystallinity, and showed very good pattern fidelity. © 2012 Springer Science+Business Media, LLC.
KSP Keywords
Ammonium hydroxide, Etching process, High-purity, One-step, Pattern fidelity, Patterning process, TMAH solution, XRD patterns, Zinc acetate, ZnO nanowire, ZnO seed layer