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Journal Article Echelle Grating Silicon Multi/Demultiplexers with Single-reflection Total Internal Reflectors
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Authors
Sahnggi Park, Sang-Gi Kim, Jeagyu Park, Gyungock Kim
Issue Date
2012-10
Citation
Optics Express, v.20, no.21, pp.23582-23586
ISSN
1094-4087
Publisher
Optical Society of America(OSA),
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1364/OE.20.023582
Project Code
12VB1600, Silicon Nanophotonics-based next-generation computer chip, Kim Gyungock
Abstract
We present a silicon-on-insulator Echelle grating 8-channel demutiplexer showing characteristic features, average insertion loss 2.4 dB measured at 1520-1570 nm, adjacent channel crosstalk 15-18 dB, and channel spacing 11.9 nm. Our Echelle grating is remarked by a total internal reflector (TIR) which reflects incident light by a single reflection in contrast to the double reflections of retro-reflector TIR Echelle gratings. © 2012 Optical Society of America.
KSP Keywords
Adjacent channel, Channel crosstalk, Channel spacing, Characteristic features, Echelle grating, Internal reflector, Retro-reflector, Silicon On Insulator(SOI), insertion loss
This work is distributed under the term of Creative Commons License (CCL)
(CC BY)
CC BY