상세정보
학술지
Growth of large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin film by cylindrical hollow cathode sputtering
- 발행일
- 200103
- 출처
- IEEE Transactions on Applied Superconductivity, v.11 no.1, pp.3844-3847
- ISSN
- 1051-8223
- 출판사
- IEEE
- 협약과제
- 01MB1400, 밀리미터파 고온초전도 믹서, 강광용
- 초록
- We have deposited large area YBa2Cu3O7-x thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. The x-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented structure. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 4 m廓 at 25 K and 40 m廓 at 77 K and 19.6 GHz.
- KSP 제안 키워드
- 6 GHz, 77 K, Cathode sputtering, Hollow cathode, Microwave surface resistance, Scanning electron micrographs, X thin films, X-ray diffraction analysis, Zero resistance temperature, c-Axis oriented, large area