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Journal Article
Growth of large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin film by cylindrical hollow cathode sputtering
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- Authors
- Jeong-Dae Suh, Seok Kil Han, Kwang Yong Kang, Min Hwan Kwak
- Issue Date
- 2001-03
- Citation
- IEEE Transactions on Applied Superconductivity, v.11, no.1, pp.3844-3847
- ISSN
- 1051-8223
- Publisher
- IEEE
- Language
- English
- Type
- Journal Article
- Abstract
- We have deposited large area YBa2Cu3O7-x thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. The x-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented structure. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 4 m廓 at 25 K and 40 m廓 at 77 K and 19.6 GHz.
- KSP Keywords
- 6 GHz, 77 K, Cathode sputtering, Diffraction analysis, Hollow cathode, Microwave surface resistance, Scanning electron micrographs, X thin films, X-ray Diffraction, X-ray diffractometer(XRD), Zero resistance temperature