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Enhanced Bias Illumination Stability of Oxide Thin Film Transistor through Insertion of Ultrathin Positive Charge Barrier into Active Material
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- Authors
- Himchan Oh, Sang-Hee Ko Park, Chi-Sun Hwang, Shinhyuk Yang, Min Ki Ryu
- Issue Date
- 2011-07
- Citation
- Applied Physics Letters, v.99, no.2, pp.1-3
- ISSN
- 0003-6951
- Publisher
- American Institute of Physics (AIP)
- Language
- English
- Type
- Journal Article
- Abstract
- A novel strategy to enhance the bias and illumination stress stability of oxide thin-film transistors (TFTs) is presented. The ultrathin positive charge barrier is employed to block the movement of photo-generated charges toward the interface between gate insulator and semiconductor under negative gate bias and illumination. This method can break through the limitation in stability enhancement caused by the inevitable oxygen vacancy and facilitates the fabrication of highly stable oxide TFTs at low process temperature. © 2011 American Institute of Physics.
- KSP Keywords
- Active materials, Charge barrier, Highly stable, Oxide TFTs, Oxygen vacancy, Positive charge, Process temperature, Thin-Film Transistor(TFT), gate bias, gate insulator, oxide thin-film transistors