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Journal Article Athermalized Polymeric Arrayed-Waveguide Grating by Partial Detachment from a Si Substrate
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Authors
Jong-Moo Lee, Joon Tae Ahn, Suntak Park, Myung-Hyun Lee
Issue Date
2004-06
Citation
ETRI Journal, v.26, no.3, pp.281-284
ISSN
1225-6463
Publisher
한국전자통신연구원 (ETRI)
Type
Journal Article
DOI
https://dx.doi.org/10.4218/etrij.04.0203.0027
Abstract
We demonstrate a new fabrication method for adjusting the temperature dependence of a polymeric arrayed-waveguide grating (AWG) on a Si substrate. A temperature-dependent wavelength shift of -0.1 nm/°C in a polymeric AWG on a Si substrate is reduced to +0.01 nm/°C by detaching part of the polymer film, including the grating channel region of the AWG, from the Si substrate while the other parts remain fixed on the substrate.
KSP Keywords
Fabrication method, Polymer films, Si substrate, Temperature-dependent, arrayed waveguide grating(AWG), temperature dependence, wavelength shift
This work is distributed under the term of Korea Open Government License (KOGL)
(Type 4: : Type 1 + Commercial Use Prohibition+Change Prohibition)
Type 4: