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학술지 Ultrathin Film Encapsulation of an OLED by ALD
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저자
박상희, 오지영, 황치선, 이정익, 양용석, 추혜용
발행일
200502
출처
Electrochemical and Solid-State Letters, v.8 no.2, pp.21-23
ISSN
1099-0062
출판사
Electrochemical Society (ECS)
DOI
https://dx.doi.org/10.1149/1.1850396
협약과제
04MB2400, Flexible 디스플레이 (차세대 디스플레이 기술 개발), 강광용
초록
Fabrication of barrier layers on a PES film and an organic light emitting diode (OLED) based on a glass substrate by atomic layer deposition (ALD) have been carried out. Deposition of 30 nm of AlOx film on both sides of PES film at 90°C gave film MOCON value of 0.0615 g/m2/day. The passivation performance of the double layer consisting of SiNx deposited by plasma-enhanced chemical vapor deposition and AlOx by ALD on the OLED has been investigated using the OLED based on a glass substrate. Preliminary life time of two pairs of double layer coated OLED to 65% of initial luminance was 600 h at the initial luminance of 1200cd/m2. © 2005 The Electrochemical Society. All rights reserved.
KSP 제안 키워드
Atomic Layer Deposition, Barrier layers, Double layer, Glass substrate, Life time, Organic light-emitting diodes(OLEDS), Plasma-enhanced chemical vapor deposition(PECVD), Ultrathin film, light-emitting diode(LED)