상세정보
학술지
Ultrathin Film Encapsulation of an OLED by ALD
- 발행일
- 200502
- 출처
- Electrochemical and Solid-State Letters, v.8 no.2, pp.21-23
- ISSN
- 1099-0062
- 출판사
- Electrochemical Society (ECS)
- 협약과제
- 04MB2400, Flexible 디스플레이 (차세대 디스플레이 기술 개발), 강광용
- 초록
- Fabrication of barrier layers on a PES film and an organic light emitting diode (OLED) based on a glass substrate by atomic layer deposition (ALD) have been carried out. Deposition of 30 nm of AlOx film on both sides of PES film at 90°C gave film MOCON value of 0.0615 g/m2/day. The passivation performance of the double layer consisting of SiNx deposited by plasma-enhanced chemical vapor deposition and AlOx by ALD on the OLED has been investigated using the OLED based on a glass substrate. Preliminary life time of two pairs of double layer coated OLED to 65% of initial luminance was 600 h at the initial luminance of 1200cd/m2. © 2005 The Electrochemical Society. All rights reserved.
- KSP 제안 키워드
- Atomic Layer Deposition, Barrier layers, Double layer, Glass substrate, Life time, Organic light-emitting diodes(OLEDS), Plasma-enhanced chemical vapor deposition(PECVD), Ultrathin film, light-emitting diode(LED)