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Improvement of fabrication yield and loss uniformity of waveguide mirror
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- Authors
- Jeong-Woo Park, Eun-Deok Sim, Yong-Soon Beak
- Issue Date
- 2005-04
- Citation
- IEEE Photonics Technology Letters, v.17, no.4, pp.807-809
- ISSN
- 1041-1135
- Publisher
- IEEE
- Language
- English
- Type
- Journal Article
- Abstract
- Using a calculation of overlap integral loss of waveguide mirror was analyzed. According to this analysis method, a taper section was introduced and loss of deep ridge waveguide mirror was improved by 1.1 dB. Analysis shows that the most significant source of loss is the bevel angle of mirror facet. Also, using this method, improvement of fabrication yield and uniformity was obtained. This analysis and design method can be applied to mirrors for integrated photonic circuits and optical printed circuit board. © 2005 IEEE.
- KSP Keywords
- Analysis method, Deep ridge waveguide, Design method, Optical printed circuit board(OPCB), Ridge waveguides(RWs), analysis and design, integrated photonic circuits, overlap integral, printed circuit board(PCB)