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Journal Article Improvement of fabrication yield and loss uniformity of waveguide mirror
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Authors
Jeong-Woo Park, Eun-Deok Sim, Yong-Soon Beak
Issue Date
2005-04
Citation
IEEE Photonics Technology Letters, v.17, no.4, pp.807-809
ISSN
1041-1135
Publisher
IEEE
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1109/LPT.2005.843686
Abstract
Using a calculation of overlap integral loss of waveguide mirror was analyzed. According to this analysis method, a taper section was introduced and loss of deep ridge waveguide mirror was improved by 1.1 dB. Analysis shows that the most significant source of loss is the bevel angle of mirror facet. Also, using this method, improvement of fabrication yield and uniformity was obtained. This analysis and design method can be applied to mirrors for integrated photonic circuits and optical printed circuit board. © 2005 IEEE.
KSP Keywords
Analysis method, Deep ridge waveguide, Design method, Optical printed circuit board(OPCB), Ridge waveguides(RWs), analysis and design, integrated photonic circuits, overlap integral, printed circuit board(PCB)