ETRI Knowledge Sharing Platform : Fabrication of Nano Scale Electrode for Sensor Using Nanoimprint Lithography

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Journal Article Fabrication of Nano Scale Electrode for Sensor Using Nanoimprint Lithography

Cited 2 time in scopus

Authors: Nak-Jin Choi, Junghyun Lee, Gyeong Sook Bang, Hyung-Kun Lee, Seung Eon Moon, Woo Seok Yang, Hyoyoung Lee

Citation: Journal of Nanoelectronics and Optoelectronics, v.10, no.4, pp.480-484

Abstract: We have developed a single-layer UV-nanoimprint process, which was utilized to fabricate 9 by 9 crossbar circuits with various nano-scaled electrodes. Fabricated nano-sized electrode using mold has sub 100 nm width and sub 1 nm average roughness. Their surface morphology was observed by using atomic force microscopy (AFM) and scanning electron microscopy (SEM). And we have proved that the double layer electrodes can be fabricated by layer by layer fabrication method of nanoimprint technique.

KSP Keywords: Atomic force microscope(AFM), Atomic force microscopy (afm), Double layer, Fabrication method, Layer-by-Layer(LbL), Scanning electron microscopy(S.E.M.), Single-layer, UV nanoimprint, average roughness, nano-scale, nano-sized

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