상세정보
학술지
Nanofabrication of InGaAsP periodic 2D columns with square and hexagonal lattices by reactive ion etching
- 발행일
- 200503
- 출처
- Thin Solid Films, v.475 no.1-2, pp.189-193
- ISSN
- 0040-6090
- 출판사
- Elsevier
- 협약과제
- 05MB3600, 광엑세스용 광집적 모듈, 오광룡
- 초록
- Two-dimensionally arrayed nanocolumns were fabricated by using a double-exposure laser holography method. The hexagonal lattice was formed by rotating the sample with 60째 while the square lattice by 90째 before the second laser exposure. The size and period of nanocolumns could be controlled accurately from 80 to 150 nm in diameter and 220 to 450 nm in period for square lattice by changing the incident angle of laser beam. The reactive ion etching (RIE) for a typical time of 30 min using CH4/H2 plasma enhanced the aspect ratio by more than 1.5 with a slight increase of the bottom width of columns. Furthermore, it was observed that a wet etching after reactive ion etching enhanced the photoluminescence intensity of nanocolumns due to the removal of sidewall damage. © 2004 Elsevier B.V. All rights reserved.
- KSP 제안 키워드
- Incident angle, Laser beams, Laser holography, Photoluminescence intensity, Plasma-enhanced, Reactive ion etching(RIE), Square lattice, Wet etching, aspect ratio, hexagonal lattice