Journal Article
Optimisation of Bi-Layer Resist Overhang Structure Formation and SiO2 Sputter-Deposition Process for Fabrication of Gold Multi-Electrode Array
In this paper we report the results on the optimization of the bi-layer lift-off resist (LOR) SiO2 sputter-deposition technique which is ideal for obtaining damage-free multi-electrode array (MEA). To optimize the bi-layer overhang formation, we have examined the undercut formation kinetics of LOR bottom layer and the dependence of the SiO2 sputter-deposition lift-off processed electrode structure on the undercut length. Crater-shaped and recessed electrode structure is obtained when the undercut length is short (?돞2 μm) and longer than 3 μm, respectively. To optimize the SiO2 sputter-deposition process, we have examined the dependence of Au electrode passivation on the SiO2 sputtering parameters in terms of electrochemical cyclic-voltammogram (CV), impedance, electrical noise, sputter-deposition rate and in vitro neuronal activity recording property. The MEAs passivated under pure argon supply condition showed poor barrier properties, poor neuronal signal recording performance, and cytotoxic property. The CV of MEAs passivated under oxygen mixing ratios above 5% showed traditional sigmoidal CV and long-term recording of neuronal activities, probing the excellent barrier property and cytocompatibility of the SiO2 films sputter-deposited under oxygen mixing conditions. We have also issued thermal damaging aspect of bi-layer overhang structure which is tightly coupled with the detailed electrode structure and the high sputter-deposition rate. Finally, it was suggested that measurement of CV, electrochemical impedance and electrical noise can be a viable tool in evaluating the barrier performance of a passivation layer.
The materials provided on this website are subject to copyrights owned by ETRI and protected by the Copyright Act. Any reproduction, modification, or distribution, in whole or in part, requires the prior explicit approval of ETRI. However, under Article 24.2 of the Copyright Act, the materials may be freely used provided the user complies with the following terms:
The materials to be used must have attached a Korea Open Government License (KOGL) Type 4 symbol, which is similar to CC-BY-NC-ND (Creative Commons Attribution Non-Commercial No Derivatives License). Users are free to use the materials only for non-commercial purposes, provided that original works are properly cited and that no alterations, modifications, or changes to such works is made. This website may contain materials for which ETRI does not hold full copyright or for which ETRI shares copyright in conjunction with other third parties. Without explicit permission, any use of such materials without KOGL indication is strictly prohibited and will constitute an infringement of the copyright of ETRI or of the relevant copyright holders.
J. Kim et. al, "Trends in Lightweight Kernel for Many core Based High-Performance Computing", Electronics and Telecommunications Trends. Vol. 32, No. 4, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
J. Sim et.al, “the Fourth Industrial Revolution and ICT – IDX Strategy for leading the Fourth Industrial Revolution”, ETRI Insight, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
If you have any questions or concerns about these terms of use, or if you would like to request permission to use any material on this website, please feel free to contact us
KOGL Type 4:(Source Indication + Commercial Use Prohibition+Change Prohibition)
Contact ETRI, Research Information Service Section
Privacy Policy
ETRI KSP Privacy Policy
ETRI does not collect personal information from external users who access our Knowledge Sharing Platform (KSP). Unathorized automated collection of researcher information from our platform without ETRI's consent is strictly prohibited.
[Researcher Information Disclosure] ETRI publicly shares specific researcher information related to research outcomes, including the researcher's name, department, work email, and work phone number.
※ ETRI does not share employee photographs with external users without the explicit consent of the researcher. If a researcher provides consent, their photograph may be displayed on the KSP.