BROWSE
Detail
Journal Article
Nanoscale thin-film Morphologies and Field-Effect Transistor Behavior of Oligothiophene Derivatives
Cited 45 time in 
Share 
Share
- Authors
- Eun Hee Lim, Byung Jun Jung, Hong Ku Shim, Tomohiro Taguchi, Bunpei Noda, Takuya Kambayashi, Takehiko Mori, Ken Ishikawa, Hideo Takezoe, Lee Mi Do
- Issue Date
- 2006-06
- Citation
- Organic Electronics, v.7, no.3, pp.121-131
- ISSN
- 1566-1199
- Publisher
- Elsevier
- Language
- English
- Type
- Journal Article
- Abstract
- The field-effect transistor (FET) performances of two thiophene-based semiconducting materials (T2TT and T2FL) were examined. Through studies of the thin-film morphology using X-ray diffraction (XRD) and atomic force microscopy (AFM), we could access the behavior and structure of the thin-film devices at the nanoscale level in single molecular layers and determine the correlation between molecular alignment and device performance. Due to the extended ?-conjugation, efficient hole injection, and good molecular alignment, the T2TT and T2FL FET devices exhibited hole mobilities of up to 0.03 cm2 V-1 s-1, when the films were deposited at Tsub = RT and 80 °C, respectively. In spite of the large number of small grains in the film deposited at room temperature, the T2TT molecules were aligned perpendicular to the substrate when deposited at this low substrate temperature, which favored ?-? overlap between adjacent molecules, resulting in high OFET performance. © 2005 Elsevier B.V. All rights reserved.
- KSP Keywords
- Atomic force microscope(AFM), Atomic force microscopy (afm), FET devices, Field effect transistors(Substrate temperature), Field-effect transistors(FETs), First Stokes(S1), Low substrate temperature, Molecular alignment, Oligothiophene derivatives, Room-temperature, Small grains