300 nm SiO$_2$ 와 150 nm Al$_2$O$_3$ 게이트 유전체를 가지는 pentacene 트랜지스터에서 각종 표면 처리 방법에 따른 transfer curve의 특성 변화에 대하여 연구하였고, 이를 통해 20 V 내외에서 트랜지스터의 문턱전압 (V$_{th}$)를 제어할 수 있었다. 특히 Al$_2$O$_3$를 게이트 유전체로 depletion mode와 enhancement mode 인버터를 각각 제작하여, 인버터 전압전달 특성의 불안정성에 미치는 단위 트랜지스터의 V$_{th}$와 이력 (hysteresis) 특성에 대해 연구하였다. Enhancement mode 인버터의 경우 전압전달 특성의 shift 현상이 더 복잡하고 심각한 것으로 관찰되었다. Inversion voltage가 negative shift 하고 swing 폭이 감소하는 현상이 발견되었는데 이는 각각 driver 트랜지스터와 load 트랜지스터의 V$_{th}$가 negative로 shift 하기 때문으로 밝혀졌다.
KSP Keywords
Negative shift, enhancement-mode
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