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Conference Paper 50㎚ E-Beam Lithography Process using a Bilayer Resist Structure for Nano T-gate MHEMTs
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Authors
Jae Yeob Shim, Hyung Sup Yoon, Ju Yeon Hong, Dong Min Kang, Kyung Ho Lee
Issue Date
2006-08
Citation
International Symposium on the Physics of Semiconductors and Applications (ISPSA) 2006, pp.1-1
Language
English
Type
Conference Paper
KSP Keywords
Bilayer resist, E-beam Lithography, T-Gate, lithography process
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