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Conference Paper
Comparative Study of DC and Microwave Characteristics of 0.12 μm T-Shaped Gate AlGaAs/InGaAs/GaAs PHEMTs Using a Hybrid and Conventional E-beam Lithography Process
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- Authors
- Jong Won Lim, Seok Won Yoon, Ho Kyun Ahn, Hong Gu Ji, Woo Jin Chang, Jae Kyoung Mun, Hae Cheon Kim
- Issue Date
- 2006-09
- Citation
- International Conference on Solid State Devices and Materials (SSDM) 2006, pp.956-957
- Language
- English
- Type
- Conference Paper
- KSP Keywords
- AlGaAs/InGaAs/GaAs pHEMTs, E-beam Lithography, T-shaped gate, comparative study, lithography process, microwave characteristics